Domain structures supported by micron-sized patterned co/cu multilayers with AF and FM coupling

P.R. Aitchison; J.N. Chapman; K.J. Kirk; D.B. Jardine; J.E. Evetts

doi:10.1109/20.706341

Domain structures supported by micron-sized patterned co/cu multilayers with AF and FM coupling

P.R. Aitchison
, J.N. Chapman
, K.J. Kirk
, D.B. Jardine
, J.E. Evetts

School of Technology

Research output: Contribution to Journal › Article › peer-review

Abstract

Micron-sized Co/Cu multilayer elements were prepared by dc magnetron sputtering and subsequent lift-off patterning. Two types of patterned multilayers, AF or PM coupled, were produced by controlling the width of the Cu spacer layers. Domain structures supported by these elements during magnetic switching have been imaged directly using the Lorentz imaging mode, differential phase contrast, in TEM. Patterning of the FM coupled multilayers introduces significant differences in the domain structures observed in the films as they adopt flux closure geometries in the remanent state. For AF-coupled multilayers little change occurs.

Original language	English
Pages (from-to)	1012-1014
Journal	IEEE Transactions on Magnetics
Volume	34
Issue number	4
DOIs	https://doi.org/10.1109/20.706341
Publication status	Published - 31 Jul 1998

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title = "Domain structures supported by micron-sized patterned co/cu multilayers with AF and FM coupling",

abstract = "Micron-sized Co/Cu multilayer elements were prepared by dc magnetron sputtering and subsequent lift-off patterning. Two types of patterned multilayers, AF or PM coupled, were produced by controlling the width of the Cu spacer layers. Domain structures supported by these elements during magnetic switching have been imaged directly using the Lorentz imaging mode, differential phase contrast, in TEM. Patterning of the FM coupled multilayers introduces significant differences in the domain structures observed in the films as they adopt flux closure geometries in the remanent state. For AF-coupled multilayers little change occurs.",

author = "P.R. Aitchison and J.N. Chapman and K.J. Kirk and D.B. Jardine and J.E. Evetts",

year = "1998",

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AU - Aitchison, P.R.

AU - Chapman, J.N.

AU - Kirk, K.J.

AU - Jardine, D.B.

AU - Evetts, J.E.

PY - 1998/7/31

Y1 - 1998/7/31

N2 - Micron-sized Co/Cu multilayer elements were prepared by dc magnetron sputtering and subsequent lift-off patterning. Two types of patterned multilayers, AF or PM coupled, were produced by controlling the width of the Cu spacer layers. Domain structures supported by these elements during magnetic switching have been imaged directly using the Lorentz imaging mode, differential phase contrast, in TEM. Patterning of the FM coupled multilayers introduces significant differences in the domain structures observed in the films as they adopt flux closure geometries in the remanent state. For AF-coupled multilayers little change occurs.

AB - Micron-sized Co/Cu multilayer elements were prepared by dc magnetron sputtering and subsequent lift-off patterning. Two types of patterned multilayers, AF or PM coupled, were produced by controlling the width of the Cu spacer layers. Domain structures supported by these elements during magnetic switching have been imaged directly using the Lorentz imaging mode, differential phase contrast, in TEM. Patterning of the FM coupled multilayers introduces significant differences in the domain structures observed in the films as they adopt flux closure geometries in the remanent state. For AF-coupled multilayers little change occurs.

U2 - 10.1109/20.706341

DO - 10.1109/20.706341

M3 - Article

SN - 0018-9464

VL - 34

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EP - 1014

JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

IS - 4

ER -

Domain structures supported by micron-sized patterned co/cu multilayers with AF and FM coupling

Abstract

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